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KMID : 1024520070160060683
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Journal of the Environmental Sciences
2007 Volume.16 No. 6 p.683 ~ p.688
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Manufacturing and Characterization of N-doped TiO₂ Photocatalytic Thin Film
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Park Sang-Won
Nam Soo-Kyung
Heo Jae-Eun
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Abstract
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In this study, N doped (TiO-N) thin film was prepared by DC magnetron sputtering method to show the photocatalytic activity in a visible range. Various gases (Ar, ) were used and Ti target was impressed by 1.2 kW -5.8 kW power range. The hysteresis of TiO-N thin film as a function of discharge voltage wasn’t observed in 1.2 and 2.9kW of applied power. Cross sections and surfaces of thin films by FE-SEM were tiny and dense particle sizes of both films with normal cylindrical structures. XRD pattern of and TiO-N thin films was appeared by only anatase peak. Red shift in UV-Vis adsorption spectra was investigated TiO-N thin film. Photoactivity was evaluated by removal rate measurement of suncion yellow among reactive dyes. The photodegradation rate of thin film on visible radiation was shown little efficiency but TiO-N was about 18%.
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KEYWORD
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Visible light photocatalyst, TiO-N, DC magnetron sputtering, Red shift, Hysteresis, Photodegradation, Suncion Yellow
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